We’re doing a DPA on a 5962R0722962VZA (LM117HVGWRLQMLV). Per MIL-STD-883, TM 2018, SEM is not required for planar die. Is the die fully planar with no oxide steps? Are chemical mechanical polish (CMP) processes used? Or is SEM required?
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We’re doing a DPA on a 5962R0722962VZA (LM117HVGWRLQMLV). Per MIL-STD-883, TM 2018, SEM is not required for planar die. Is the die fully planar with no oxide steps? Are chemical mechanical polish (CMP) processes used? Or is SEM required?
Hello Michael,
It is not planar. Per mil standards, TI performs step coverage measurements on two wafers of every wafer lot.