Tool/software:
I’m pleased that we’ve had great success in one of our mid-volume products using your Femto-FET MOSFETs.
I have a new design which will be a higher volume product, expected over 1 Million circuits.
The design has 3-4 similar circuits, all powered from a coin-cell which is regulated to 1.2v. Ultra-low current draw is a key requirement.
It is a very critical design and needs to be extremely reliable and robust.
We plan to use both N-Channel and P-Channel MOSFETs in the design. Key parameters are Vgs(th) and Idss and Igss leakage currents. The operating environment is -40 to 100C.
I have successfully simulated over our entire temperature range for one of circuits using your N-Ch CSD15380.
The simulation model seems to do a great job at modeling Vgs(th) and both leakage currents, Idss and Igss, over our temperature range.
I’m aware that Vgs(th) has a negative temp. coefficient. Most datasheets for MOSFETs doesn’t adequately cover leakage parameters.
Could you explain more about how leakage is modeled. Is it based on measured data or does TI generate a simulation model based on knowledge of the fabrication of the device?
How well does that model for leakage take into account temperature affects?
How conservative is the model i.e. does it have adequate margin to account for fabrication process variations?
I’m not aware of any method to simulate both over temperature and across process variation. However, what I’ve done is to simulate 30 degrees higher than our expected environment to ensure margin.
Would love to get feedback on this approach.