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DLPC150: 95.UB101GC0A

Part Number: DLPC150

Hello,

I am working on DLPNIRscanNanoGUI_2.1.0 source code (I am also working on nano_api.dll) and I have a question about exposure time.

Does the NIR sensor have a limit on exposure time?

I can see the limit in Tiva Software (60.960 ms) however if I change the code and add a new higher exposure time it does have any impact on the actual exposure time? 

Is there an "electronic" limit to the exposure time value in this spectro.

Thanks.

  • Hello,

    Welcome back to the E2E forums and we hope to assist you with your questions. 

    Please give us some time to look into this issue.

    Regards,

    Alex Chan

  • HI Christian,

    Exposure time has an impact on the num of patterns and pattern rate to displayed on the DMD. There is no electronic limit as such.

    By default we support upto 4 times the active vsync pattern period(15.24 msec). Hence max exposure time is 60.96 msecs.

    If you need more exposure time than this additional to adding the higher exposure time enum. you need to write the logic to handle patterns .

    FYR you can refer to Scan_SetUpSlewScan() in scan,c of TIVA software.

    Alternatively, You can have back to back scans count increased in the EVM GUI scan settings page to get longer exposure time.

    Also could you please let us know what is the application intended where you want longer exposure time?

    Regards,

    Akhil

  • Hi Akhil,

    Thank you for your answer.

    I am trying to use longer exposure time for my application which uses nano_api.dll.

    Is there a way to change exposure time by changing code in NanoGUI sources folder (where we build nanoapi.dll) rather than changing Tiva software sources code?

    Best regards,

    Christian

  • Hi Christian,

    Our expert will get back to you next week.

    Regards,

    Lori 

  • Hi Christian,

    Unfortuantely, As I said earlier this would need changes in the TIVA source code. Chanegs made in GUI can only help in showing the exposure time but it will not actually create long exposure time in the EVM.  SInce TIVA is the hostr controller that can control and generate patterns this would need changes in TIVA firmware.

    Also Could you please let me know what are your thoughts on enabling back to back scans.

    Regards,
    Akhil