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DLPLCR6500EVM: Refreshing of mirrors at every 105us

Part Number: DLPLCR6500EVM

Hi,

I'm currently using the DLPLCR6500EVM and there's a slight problem regarding the refreshing of the mirrors.

In order to stop the mirrors from getting stuck, it seems that the micro-mirrors return to its off state every 105us.

Though it happens very fast, this has detrimental effects for my application.

Would it be possible for me to buy a new factory programmed DLPLCR6500EVM which allows the micro-mirrors to refresh itself every 10 seconds rather than 105us?

I will take full responsibility for its consequences.

Best regards,

Kyuhwan

  • Hello Kyuhwan,

    Welcome to the DLP section of the TI-E2E forums.

    What input mode are you using?  If Video, then this is driven by the video system.

    Are you sending in dynamic patterns (i.e. a video stream) or do you have a fixed set of patterns you wish to run?  

    The programming would be the same on a new EVM.  

    Fizix

  • Hi Fizix,

    First of all, thank you for your reply!!

    I am currently operating "pattern on the fly" mode and sending a static image to the EVM board.

    Basically, I am having the same problem as the post in https://e2e.ti.com/support/dlp/f/94/p/552904/2028055?tisearch=e2e-sitesearch&keymatch=eunmi#pi320995=1.

    In short, I am shining a laser to a static image of the DLPLCR6500EVM and measuring the intensity of the reflected image using a photodiode which is connected to a oscilloscope for monitoring.

    The signal from the oscilloscope can be seen in the figure below.

    dmd_intensity

    I understand that this refreshing of mirrors(the large dips in the oscilloscope) is intended to prevent the mirrors from freezing out.

    I was wondering if we could ask for a modified EVM board that allows this refreshing to happen every 10 seconds rather than 105us.

    Thank you,

    Kyuhwan

  • Hello Kyuhwan,

    This behavior is driven by the underlying DLPC900 ASIC.  It cannot be changed programmatically.

    We also do not provided modified EVMs, but you can make the modification mentioned in the E2E thread you cited or have a third party do it for you.

    What did you put for the exposure time for your pattern in the Pattern On-The-Fly Mode?

    Fizix

  • Hi Fizix,

    I have put the exposure time to be 1 second in the pattern on-the-fly mode.

    I guess I'll have to try my best on modifying the hardware.

    Thanks,

    Kyuhwan

  • Hello Kyuhwan,

    Thank you for getting back to us on this.  

    You are not alone in requesting this kind of control and we are considering it as a possible future improvement, but no promises at this time.  What I am trying to say is that this kind of feedback is useful and often forms the basis of adding new feature or improved functionality.  Thank you.

    Best regards,

    Fizix