This thread has been locked.

If you have a related question, please click the "Ask a related question" button in the top right corner. The newly created question will be automatically linked to this question.

TDC1000: Trying to find the suitable sensor for concentration measurement on flowing slurry in pipeline.

Part Number: TDC1000
Other Parts Discussed in Thread: , TUSS4470, PGA460, TDC1011, TUSS4440

Hi,

I need to get advice for the suitable sensors/device that can be used for concentration measurement on slurry flow in pipeline preferably on higher flow rate. I have looking into TDC1000-C2000EVM but there is no mention for the use in my application. Hope you can help.

Thank you.

  • Syazwan,

    The TDC1000 is no longer recommended for flow applications, only level sensing or static concentration/identification applications.

    Using the TDC1000 flow meter configuration is known to have issues in repeatability and accuracy when there is no flow (with or without liquid present). Due to this, we recommend the MSP430 devices for flow metering applications: http://www.ti.com/microcontrollers/msp430-ultra-low-power-mcus/ultrasonic-performance-sensing-mcus-overview.html

  • Akeem,

    Thank you for your prompt response. I understand that the MSP430 is used in the flow metering/flow rate measurement, however if the flow is contaminated with e.g. micro sand/mud will it be able to measure the concentration of the contamination?

    Currently my application is to measure/count the amount of the contaminated flow using the ultrasonic method by observing the response signal compared to clear flow. From this hopefully I can work on calculating the amount of slurry contamination.

  • Syazwan,

    It will be difficult to measure both flow rate and contamination amount using only a flow meter setup. To make a concentration/contamination measurement, you will need the liquid medium to be still (no flow) in a container with a fixed/know distance to monitor changes in the time of flight result.

    A contaminated flow will also affect the accuracy of your flow rate measurement, so you need to know the result of the contamination measurement from an independent no-flow measurement to calibrate the estimated speed of sound for the flow rate measurement.

    Here is my overall assessment:

    • Ultrasonic Flow rate with possible contamination variations is a challenge.
    • TI has not attempted this specific combination use-case, so we unable to provide a parallel data set for comparison.
    • We are no longer recommending the TDC1000 for flow metering in general. Though the TDC1000 is ideal given it is a two channel ultrasonic device, I still recommend using the MSP430 ultrasonic flow meter device or using a pair of the new TUSS4470 devices due to its performance improvements over the TDC1000.

  • Akeem,

    Thank you for the answers. At the moment, my intention is only working on concentration of slurry flow and in any case I don't plan to measure the flow rate. Any signal changes involving TOF or the attenuation rates will be compared with clear flow.

    I am not familiar with TI EVM so for now I will assume that MSP430 is the best option in my application.

    Regards

  • Syazwan,

    I now understand: slurry flow is your description of the medium, and is not necessarily an active/turbulent flow (can be static).

    In that case, the MSP430 ultrasonic devices are best suited for active flow rate measurements, so you do not necessarily want to use the MSP430s.

    If you are only looking at changes to the time-of-flight and/or the echo amplitude/attenuation for static concentration purposes, you can actually use the TUSS4470, TUSS4440, or PGA460, or TDC1011 devices. The TUSS4470 is my personal recommendation considering it supports ultrasonic transducers up to 1MHz.

  • Akeem,

    Thank you for the answers. I will look into your suggested devices and will contact TI further for the specific devices. For now I consider this as resolved.

    Regards